Fast Low-Temperature Plasma Process for the Application of Flexible Tin-Oxide-Channel Thin Film Transistors

P.-C. Chen, Y.-C. Chiu, Z.-W. Zheng, M.-H. Lin, G.-L. Liou, H.-H. Hsu, C.-H. Cheng, H.-L. Kao, Y. H. Wu, and C. Y. Chang, “Fast Low-Temperature Plasma Process for the Application of Flexible Tin-Oxide-Channel Thin Film Transistors,” IEEE Transactions on Nanotechnology, vol. 16, Issue 5, 2017, pp. 876 – 879. 2017/5/1