Current crowding effect on submicron copper dual damascene via bottom failure
A. Roy and C. M. Tan. “Current crowding effect on submicron copper dual damascene via bottom failure,” in Symp. on Microelectronics, 2004.
A. Roy and C. M. Tan. “Current crowding effect on submicron copper dual damascene via bottom failure,” in Symp. on Microelectronics, 2004.
