The demonstration of recessed anodes AlGaN/GaN Schottky barrier diodes using microwave cyclic plasma oxidation/wet etching techniques

K.-P. Hsueh, H.-C. Chiu, H.-C. Wang, H.-L. Kao, F.-T. Chien, W.-Y. Lin, “The demonstration of recessed anodes AlGaN/GaN Schottky barrier diodes using microwave cyclic plasma oxidation/wet etching techniques, ” Japanese Journal of Applied Physics, vol. 58, no. 7, 2019, pp. 071002. 2019/7/1