Study of interaction between a-Ta films and SiO2 under rapid thermal annealing

Z. L. Yuan, D. H. Zhang, C. Y. Li, K. Prasad, L. J. Tang, C. M. Tan, R. Kumar, and P.D. Foo. “Study of interaction between a-Ta films and SiO2 under rapid thermal annealing,” in Int. Conf. on Materials for Advanced Technologies, 2003.