Characterization of a-Ta diffusion barrier for copper metallization
Z. L. Yuan, D. H. Zhang, C. Y. Li, K. Prasad, C. M. Tan, R. Kumar, and P. D. Foo. “Characterization of a-Ta diffusion barrier for copper metallization,” in VMIC, 2002.
Z. L. Yuan, D. H. Zhang, C. Y. Li, K. Prasad, C. M. Tan, R. Kumar, and P. D. Foo. “Characterization of a-Ta diffusion barrier for copper metallization,” in VMIC, 2002.
