Temperature dependence of the field emission of multiwalled carbon nanotubes 期刊 Journal Paper Temperature dependence of the field emission of multiwalled carbon nanotubes 閱讀全文 »
Effect of vacuum break after the barrier layer deposition on the electromigration performance of aluminum based line interconnects 期刊 Journal Paper Effect of vacuum break after the barrier layer deposition on the electromigration performance of aluminum based line interconnects 閱讀全文 »
Effect of test condition and stress free temperature on the electromigration failure of Cu dual damascene submicron interconnect line-via test structures 期刊 Journal Paper Effect of test condition and stress free temperature on the electromigration failure of Cu dual damascene submicron interconnect line-via test structures 閱讀全文 »
Current crowding effect on copper dual damascene via bottom failure for ULSI applications 期刊 Journal Paper Current crowding effect on copper dual damascene via bottom failure for ULSI applications 閱讀全文 »
Stress migration reliability of wide Cu interconnects with Gouging Vias 刊物 Publication, 會議論文 Conference Paper, 陳始明 Dr. Tan, Cher Ming Stress migration reliability of wide Cu interconnects with Gouging Vias 閱讀全文 »
Is electron wind force the sole driving force in electromingration of ULSI interconnection? (invited) 刊物 Publication, 會議論文 Conference Paper, 陳始明 Dr. Tan, Cher Ming Is electron wind force the sole driving force in electromingration of ULSI interconnection? (invited) 閱讀全文 »
Extrapolation of electromigration reliability assessment from accelerated test for submicron interconnect via structure 刊物 Publication, 會議論文 Conference Paper, 陳始明 Dr. Tan, Cher Ming Extrapolation of electromigration reliability assessment from accelerated test for submicron interconnect via structure 閱讀全文 »
Effect of vacuum break after the barrier layer deposition on the electromigratioin performance of aluminum based line interconnects 刊物 Publication, 會議論文 Conference Paper, 陳始明 Dr. Tan, Cher Ming Effect of vacuum break after the barrier layer deposition on the electromigratioin performance of aluminum based line interconnects 閱讀全文 »
Effect of test condition and stress free temperature on the electromigration failure of Cu dual damascene submicron interconnect line-via structures 刊物 Publication, 會議論文 Conference Paper, 陳始明 Dr. Tan, Cher Ming Effect of test condition and stress free temperature on the electromigration failure of Cu dual damascene submicron interconnect line-via structures 閱讀全文 »
Effect of medium vacuum on low temperature wafer bonding 期刊 Journal Paper Effect of medium vacuum on low temperature wafer bonding 閱讀全文 »